• reactive deposition of cobalt and nickel films from their

    Reactive Deposition of Cobalt and Nickel Films from Their

    Reactive Deposition of Conformal Metal Oxide Films from Supercritical Carbon Dioxide. Chemistry of Materials 2007, 19 (23) , 5460-5466. DOI: 10.1021/cm070288s. Adam O'Neil and, James J. Watkins. Reactive Deposition of Conformal Ruthenium Films from Supercritical Carbon Dioxide.

  • reactive deposition of cobalt and nickel films from their

    Reactive Deposition of Cobalt and Nickel Films from Their

    Download Citation | Reactive Deposition of Cobalt and Nickel Films from Their Metallocenes in Supercritical Carbon Dioxide Solution | High-purity Co and Ni thin films were deposited directly onto

  • "reactive deposition of pure and alloyed cobalt and nickel

    "Reactive deposition of pure and alloyed cobalt and nickel

    High purity films of pure and phosphorous-doped cobalt and nickel were deposited on several types of substrates in a single step without the need for catalytic seed layer. Binary cobalt-copper and cobalt-nickel films were deposited over a wide range of composition. The deposition of nickel-palladium films was also attempted.

  • deposition of nickel-cobalt alloys by controlled-potential

    Deposition of Nickel-Cobalt Alloys by Controlled-Potential

    cobalt, and 50 million lb of nickel, plus several million pounds of other alloying elements. Supera110ys and related specialty al­ loys, which comprise the single largest use category for cobalt, have perhaps the most stringent specifications of any al­ loy group. This stems from their use for

  • reactive deposition of cobalt using bis(2,2,6,6-tetramethyl-3

    Reactive deposition of cobalt using bis(2,2,6,6-tetramethyl-3

    Furthermore, deposition using tris(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(III) (Co(tmhd) 3) was also studied, and it was possible to deposit high purity cobalt films onto copper coated TaN layer at between 200 and 300 °C. However, no significant deposition was observed even at 320 °C on nSi and the barrier layers.

  • characterization of cobalt sulfide thin films synthesized

    Characterization of Cobalt Sulfide Thin Films Synthesized

    The first formal deposition of cobalt sulfide thin films by the CBD method is credited to Basu and Pramanik, almost 120 years after the CBD technique had been used as a thin film deposition technique . Review of literatures indicates that there are very few reports on chemical bath-deposited cobalt sulfide thin films [3, 20, 24–26].

  • plasma-enhanced atomic layer deposition of cobalt films using

    Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using

    For advanced Cu interconnect technology, Co films have been widely investigated to serve as the liner and seed layer replacement because of a better wettability to Cu than Ta. In this article, the Co films are grown by plasma-enhanced atomic layer deposition using Co(EtCp)2 as a precursor, and the influences of process parameters on the characteristics of the Co films are elaborately

  • us6527855b2 - atomic layer deposition of cobalt from cobalt

    US6527855B2 - Atomic layer deposition of cobalt from cobalt

    Cobalt thin films were prepared by atomic layer deposition (ALD). The precursor cobalt(II) acetylacetonate [Co(C 5 H 7 O 2 ) 2 ] was used to selectively deposit films onto iridium substrates using hydrogen reduction. Cobalt growth was observed on SiO 2 , silicon, fluorinated silica glass (FSG), and tantalum when silane was used as a reducing agent.

  • electrocatalytic oxygen evolution on electrochemically

    Electrocatalytic Oxygen Evolution on Electrochemically

    Electrocatalytic cobalt oxide layers have been prepared on nickel substrates using thermal decomposition and electrochemical deposition methods. Importantly, it was confirmed that the electrochemical deposition method could be applied to nickel foam substrates for use in zero-gap alkaline water electrolysis cells. The oxide layers produced were then investigated for their activity towards the

  • iop conference series: earth and environmental science paper

    IOP Conference Series: Earth and Environmental Science PAPER

    The deposition was carried out at a constant potential of -0.85 V vs. Ag/AgCl reference electrode. Table 1 present the experimental matrix for the synthesis of the Nickel–Cobalt and Nickel/Cobalt bimetallic. Table 2. Experimental matrix for the synthesis of the nickel-cobalt and nickel/cobalt bimetallic. Layer Bath composition Conditions of

  • atomic layer deposition of metals: precursors and film growth

    Atomic layer deposition of metals: Precursors and film growth

    Lansalot-Matras, “ Nickel allylamidinate precursors for deposition of nickel—containing films,” U.S. patent US2013/0168614 a1 (4 July 2013). Google Scholar 287.

  • laser‐induced reactive deposition of nanostructured cos2‐

    Laser‐Induced Reactive Deposition of Nanostructured CoS2‐

    Highly polymorphic cobalt sulfide represents attractive material because of its unique electronic, optical, magnetic, mechanical and catalytic properties. Pulsed laser irradiation of a solid CoS2 t...